In the magnetron sputtering coating process, the utilization rate of the target material directly determines the production cost. However, the wstitanium anode, through its unique magnetic field optimization design, has increased the utilization rate of rectangular target materials from the conventional 30% to 55%. This breakthrough has increased the coating area per kilogram of titanium target material by 80%. According to the 2024 research data of the International Thin Film Institute on semiconductor coating factories, after continuous operation for 2,000 hours, the equipment using the wstitanium cathode arc source still kept the target surface erosion uniformity error within ±3%, and the film thickness deviation was less than 5 nanometers, which increased the yield of semiconductor wafers to 99.95%. Its plasma density is stable at the level of 10 to the power of 12 per cubic centimeter, as if laying an atomically smooth base for film growth, significantly reducing the probability of coating defects.
In the high-temperature reactive sputtering scenario, the alumina coating of the wstitanium anode can achieve over 5,000 thermal shock cycles at 400 degrees Celsius without peeling. This data is derived from the accelerated aging test report of the Fraunhofer Institute in Germany. When depositing indium tin oxide transparent conductive films, the impedance matching module of the anode controls the arc discharge frequency below 50 Hertz, reducing energy fluctuations by 60% compared to traditional power supplies and achieving a film block resistance uniformity of over 85%. An application case of a certain photovoltaic glass manufacturer shows that after adopting this technology, the power consumption for coating Low-E glass per square meter has dropped from 3.5 kilowatt-hours to 2.8 kilowatt-hours. A production line with an annual output of 6 million square meters can save about 1.5 million yuan in electricity fees each year.
In response to the precise requirements of coating for flexible displays, wstitanium’s pulse power supply technology has increased the sputtering rate to 300 nanometers per minute while compressing the substrate temperature fluctuation range within ±5 degrees Celsius. According to Samsung Display’s 2023 technology white paper, the nanoscale metal film layer used for foldable screens, after 200,000 bending tests, the number of cracks in the film prepared by the wstitanium process was reduced by 70% compared to conventional methods, and the median surface roughness remained at 0.2 nanometers. This precision control ensures that the brightness uniformity deviation of organic light-emitting diode devices is less than 3%, as if a microscopic thickness regulator has been installed for each pixel.
From the perspective of the entire industrial chain benefits, the wstitanium solution has extended the maintenance cycle of coating equipment from 500 hours to 1,500 hours and reduced the target material replacement time by 40%. Boe’s 8.5-generation line practice in Chongqing shows that although the initial investment has increased by 15%, the payback period has been shortened to 16 months thanks to a 25% improvement in equipment overall efficiency and a 0.8% reduction in scrap rate. Its intelligent early warning system can also predict the anode life by analyzing the arc frequency, reducing the probability of unexpected downtime from 12% to 1.5%. This innovation is driving sputtering coating towards zero-defect manufacturing.